Citation link: http://dx.doi.org/10.25819/ubsi/10248
DC FieldValueLanguage
crisitem.author.orcid0000-0002-3701-2123-
crisitem.author.orcid0000-0002-5495-979X-
dc.contributor.authorDavydok, Anton-
dc.contributor.authorLuponosov, Yuriy N.-
dc.contributor.authorPonomarenko, Sergey A.-
dc.contributor.authorGrigorian, Souren-
dc.date.accessioned2023-02-16T08:31:33Z-
dc.date.available2023-02-16T08:31:33Z-
dc.date.issued2022de
dc.descriptionFinanziert im Rahmen der DEAL-Verträge durch die Universitätsbibliothek Siegende
dc.description.abstractA compact voltage application setup has been developed for in situ electrical testing of organic field effect transistors in combination with X-ray scattering studies at a synchrotron beamlines. Challenges faced during real condition in-operando test of newly developed OFETs originated an idea of creation of a new setup which excludes number of factors that make experiments complicated. The application of the setup is demonstrated on a prototype of an organic transistors based on α,ω-dihexyl-α-quaterthiophene molecules. The new setup allows to monitor material structural changes by X-ray scattering under applied voltage conditions and their direct correlations. The versatile setup eliminates possible shadowing effects and short circuits due to misalignment of the contacts. The electrical stability of the prototypes was characterized by the application of different voltage values. Corresponding structural changes were monitored by grazing X-ray scattering technique before, during and after the voltage was applied. The selected oligothiophene material with proved transistor properties shows high stability and directional anisotropy under applied voltage conditions. Thanks to a compact and flexible design of the setup, different type of small dimension devices could be studied under external voltage conditions at various synchrotron beamlines.en
dc.identifier.doihttp://dx.doi.org/10.25819/ubsi/10248-
dc.identifier.urihttps://dspace.ub.uni-siegen.de/handle/ubsi/2442-
dc.identifier.urnurn:nbn:de:hbz:467-24424-
dc.language.isoende
dc.sourceNanoscale research letters ; 17, article number 22. - https://doi.org/10.1186/s11671-022-03662-yde
dc.subject.ddc530 Physikde
dc.subject.otherOFETsde
dc.subject.otherOperando studiesde
dc.subject.othernanoGIWAXSde
dc.subject.othernanoGIXDde
dc.subject.otherα,ω-dihexyl-α-quaterthiophenede
dc.subject.swbThiophende
dc.subject.swbOrganischer Feldeffekttransistorde
dc.subject.swbRöntgenweitwinkelstreuungde
dc.titleIn situ coupling applied voltage and synchrotron radiation: operando characterization of transistorsen
dc.typeArticlede
item.fulltextWith Fulltext-
ubsi.publication.affiliationDepartment Physikde
ubsi.source.doi10.1186/s11671-022-03662-y-
ubsi.source.issn1556-276X-
ubsi.source.issued2022de
ubsi.source.issuenumber17de
ubsi.source.pages10de
ubsi.source.placeNew Yorkde
ubsi.source.publisherSpringerde
ubsi.source.titleNanoscale Research Lettersde
ubsi.subject.ghbsUIOSde
ubsi.subject.ghbsUIUOde
ubsi.subject.ghbsYEPde
Appears in Collections:Geförderte Open-Access-Publikationen
Files in This Item:
File Description SizeFormat
In_situ_coupling_applied_voltage.pdf3.42 MBAdobe PDFThumbnail
View/Open

This item is protected by original copyright

Show simple item record

Page view(s)

147
checked on Dec 1, 2024

Download(s)

40
checked on Dec 1, 2024

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.